Sulphuric acid 50%, CMOS for microelectronic, J.T.Baker®

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5253-09EA 0 GBP
5253-09
Sulphuric acid 50%, CMOS for microelectronic, J.T.Baker®
Sulphuric acid
Formula: H₂SO₄
MW: 98.08 g/mol
Boiling Pt: ∼100 °C (1013 hPa)
Density: 1.1…1.4 g/cm³ (20 °C)
Storage Temperature: Ambient
MDL Number: MFCD00064589
CAS Number: 7664-93-9
EINECS: 231-639-5
UN: 2796
ADR: 8,II

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Specification Test Results

For Microelectronic Use
Assay (H₂SO₄) 49.0 - 51.0 %
Color (APHA) ≤10
Residue after Ignition ≤3 ppm
Chloride (Cl) ≤1 ppm
Nitrate (NO₃) ≤0.2 ppm
Phosphate (PO₄) ≤0.5 ppm
Trace Impurities - Aluminum (Al) ≤0.100 ppm
Arsenic and Antimony (as As) ≤0.005 ppm
Trace Impurities - Barium (Ba) ≤1.000 ppm
Trace Impurities - Boron (B) ≤0.010 ppm
Trace Impurities - Cadmium (Cd) ≤0.500 ppm
Trace Impurities - Calcium (Ca) ≤1 ppm
Trace Impurities - Chromium (Cr) ≤0.500 ppm
Trace Impurities - Cobalt (Co) ≤0.500 ppm
Trace Impurities - Copper (Cu) ≤0.010 ppm
Trace Impurities - Gallium (Ga) ≤0.050 ppm
Trace Impurities - Germanium (Ge) ≤0.500 ppm
Trace Impurities - Gold (Au) ≤0.500 ppm
Trace Impurities - Iron (Fe) ≤0.2 ppm
Trace Impurities - Lead (Pb) ≤0.400 ppm
Trace Impurities - Lithium (Li) ≤1.000 ppm
Trace Impurities - Magnesium (Mg) ≤1.000 ppm
Trace Impurities - Manganese (Mn) ≤0.500 ppm
Trace Impurities - Nickel (Ni) ≤0.1 ppm
Trace Impurities - Potassium (K) ≤1.000 ppm
Trace Impurities - Silicon (Si) ≤0.500 ppm
Trace Impurities - Silver (Ag) ≤0.500 ppm
Trace Impurities - Sodium (Na) ≤1.000 ppm
Trace Impurities - Strontium (Sr) ≤0.500 ppm
Trace Impurities - Tin (Sn) ≤0.500 ppm
Trace Impurities - Zinc (Zn) ≤0.500 ppm

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