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Chemical duty high performance diaphragm pump, VP 220

Supplier: VWR Collection
The VP 220 is ideal for rotary evaporators providing the powerful vacuum needed for demanding evaporations without the use of oil pumps. VP 220 has a built-in Advanced Vapour Management (AVM) which means precise control capability for the distillation of organic solvents and applications handling aggressive vapours and gases. The VP 220 is especially effective for rotary evaporation of low boiling point solvents such as acetone, ethanol and is able to even strip DMF fast at 35 °C. The pump parts are all made of corrosion resistant materials like PTFE and Kalrez to handle aggressive vapours, and together with the vacuum adjustment, the evaporation process will be optimised. Use the vacuum adjustment to increase vacuum until bubbles form in the evaporation flask – then back off slightly. Reduce the vacuum for fast reaction to bumping or foaming.

  • Durable and strong diaphragm technology
  • Compact design, lightweight, portable
  • Powerful chemical resistant diaphragm pump
  • Adjustable vacuum to control evaporation rate
  • Very little maintenance leading to low cost of ownership and improved productivity

Delivery information: Delivered with EU, UK, CH-plug and instruction manual.



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Description Pk VWR Catalog Number Quantity
Vacuum pump with adjustable vacuum control, VP 220 1 181-0310BTU
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Model VP 220
Flow rate (l/min) 21
Flow rate (m³/h) 1,3
Final pressure (abs.) (mbar) 2,7
W×D×H (mm) 352×172×223
Weight (kg) 9,6


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Description Pk VWR Catalog Number Quantity
Maintenance kit for VP 220 pump 1 181-0314
Vapour recovery kit for VP 220 pump, allows an efficient recovery of solvent and protection of the lab environment 1 181-0317
Vapour recovery kit for VP 220 pump and gauge, allows an efficient recovery of solvent and protection of the lab environment and the gauge 1 181-0318
Separator kit for VP 220 pump, prevents liquid drops entering the pump and collects condensate at the outlet 1 181-0319
Synchro kit for VP 220 pump, allows simultaneous operation of two independent vacuum applications 1 181-0320
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